UV light absorbing material, useful e.g. as coating for glass, wood and organic polymer substrates, comprises a silica-matrix and covalently bound acrylamide residues

摘要

UV light absorbing material (I) comprises a silica-matrix and covalently bound acrylamide (A) residues. UV light absorbing material of formula (I) comprises a silica-matrix and covalently bound acrylamide (A) residues. An independent claim is included for the preparation of (I) comprising preparing a nanodispersion sol by cohydrolysis of trialkoxysilane (IIa) of formula (Si(OR)3-R1-N(R2)-C(=O)-CR3=CH-Ar1-R4) and gelling the obtained nanodispersion sol. R : 1-18C alkyl; R11-6C hydrocarbon; R2H or 1-18C alkyl; R3H or alkyl, halo, CN, acyl, carbalkoxy or carboxylic acid amide; Ar1mono or polycyclic aromatic ring system (optionally containing hetero-cyclic rings, substituted by R4), preferably phenyl (substituted by R4); and R4alkyl, alkoxy or OH. [Image].