首页> 外国专利> Addressed electrically conductive polymer structure production, involves making addressed dose to act on electrically conductive polymer by masks in radiation device, and light beam dose to act on polymer by light exposure masks

Addressed electrically conductive polymer structure production, involves making addressed dose to act on electrically conductive polymer by masks in radiation device, and light beam dose to act on polymer by light exposure masks

机译:解决了导电聚合物结构的生产问题,涉及通过辐射设备中的掩模使寻址剂量作用于导电聚合物,以及通过曝光掩模使光束剂量作用于聚合物

摘要

Production involves making an addressed dose act on an electrically conductive polymer (2) by masks (5) in a radiation device. An addressed ultraviolet (UV) light beam dose acts on the electrically conductive polymer by light exposure masks in a light exposure device. Conductivity of the electrically conductive polymer is interrupted by the masks using laser light. The electrically conductive polymer is used as conductive paths and component support points for a structure of electronic polymer circuits, components, electrodes and/or antenna in or on a substrate (1). An independent claim is also included for a device for producing addressed electrically conductive polymer structures as conductive paths and component support points for a structure of electronic polymer circuits, components, electrodes and/or antenna structures in or on a substrate.
机译:生产涉及通过辐射装置中的掩模(5)使预定剂量作用于导电聚合物(2)。所寻址的紫外线(UV)光束剂量通过曝光装置中的曝光掩模作用在导电聚合物上。使用激光,导电聚合物的导电性被掩模中断。导电聚合物用作基板(1)之中或之上的电子聚合物电路,组件,电极和/或天线的结构的导电路径和组件支撑点。还包括一种用于产生寻址的导电聚合物结构的设备的独立权利要求,该设备作为用于衬底内或衬底上的电子聚合物电路,组件,电极和/或天线结构的结构的导电路径和组件支撑点。

著录项

  • 公开/公告号DE102006010121A1

    专利类型

  • 公开/公告日2007-08-30

    原文格式PDF

  • 申请/专利权人 PUTTKAMMER FRANK;

    申请/专利号DE20061010121

  • 发明设计人 PUTTKAMMER FRANK;

    申请日2006-02-27

  • 分类号H01L51/40;H01L51/05;

  • 国家 DE

  • 入库时间 2022-08-21 20:29:23

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