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Focus / detector system of an X-ray apparatus for producing phase-contrast images

机译:用于产生相衬图像的X射线设备的聚焦/检测器系统

摘要

The invention relates to a focus / detector system (F SUB 1 /SUB, D) of an X-ray apparatus (1) for generating projective or tomographic phase contrast recordings, at least consisting of a radiation source (2) with a focus (F SUB 1 /SUB) and a focus-side source grating (G SUB 0 /SUB), which is arranged in the beam path and generates a field of beam-wise coherent X-rays, and a detector arrangement with a plurality of grating / detector modules arranged next to one another (G SUB Dx /SUB), which each have one behind the other in the beam direction: - at least one phase grating (G SUB 1x /SUB) for generating a first interference pattern, - an analysis grating (G SUB 2x /SUB) to generate another interference pattern - and surface-mounted detector elements (D SUB x /SUB), - whereby the individual grid lines of all grids (G SUB o /SUB, G SUB 1 /SUB, G SUB 2 /SUB) are aligned parallel to each other. In addition, the invention also relates to the use of this focus / detector system in an X-ray system for generating projective images, a C-arm device and a CT system.
机译:X射线设备的聚焦/检测器系统技术领域本发明涉及一种X射线设备(1)的聚焦/检测器系统(F 1 ,D),该X射线设备用于产生投影或层析X射线相衬记录,该X射线设备至少由辐射源(2)组成。具有焦点(F 1 )和焦点侧源光栅(G 0 ),该源光栅布置在光束路径中并生成沿光束方向的相干X场-射线,以及一种具有多个彼此相邻排列的光栅/检测器模块(G Dx )的检测器装置,每个光栅/检测器模块在光束方向上彼此落后:-至少一个相位光栅(G 1x )用于生成第一干涉图样;-分析光栅(G 2x )用于生成另一个干涉图样;以及表面安装的检测器元件(D x ),-所有网格的单独网格线(G o ,G 1 ,G 2 )平行排列对彼此。此外,本发明还涉及该聚焦/检测器系统在用于产生投影图像的X射线系统,C型臂装置和CT系统中的用途。

著录项

  • 公开/公告号DE102006015358A1

    专利类型

  • 公开/公告日2007-08-09

    原文格式PDF

  • 申请/专利权人 SIEMENS AG;PAUL SCHERER INSTITUT;

    申请/专利号DE20061015358

  • 发明设计人

    申请日2006-04-03

  • 分类号G01N23/04;A61B6/03;A61B6/02;G03B42/02;

  • 国家 DE

  • 入库时间 2022-08-21 20:29:19

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