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Method of applying catalytically active material, directly to heat exchanger internal surfaces without use of a carrier layer uses streamless deposition (ELP) or chemical gas phase deposition (CVD)
Method of applying catalytically active material, directly to heat exchanger internal surfaces without use of a carrier layer uses streamless deposition (ELP) or chemical gas phase deposition (CVD)
Method of applying catalytically active material, especially 10 and 11 group elements (VIIIA, 1B) to heat exchanger internal surfaces. The material is applied directly to the heat exchanger surfaces without use of a carrier layer by streamless deposition (ELP) or chemical gas phase deposition (CVD). Before deposition the heat exchanger internal surfaces can be roughened by chemical acid treatment and/or oxidation.
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