首页> 外国专利> Method of applying catalytically active material, directly to heat exchanger internal surfaces without use of a carrier layer uses streamless deposition (ELP) or chemical gas phase deposition (CVD)

Method of applying catalytically active material, directly to heat exchanger internal surfaces without use of a carrier layer uses streamless deposition (ELP) or chemical gas phase deposition (CVD)

机译:在不使用载体层的情况下将催化活性材料直接应用于热交换器内表面的方法采用无流沉积(ELP)或化学气相沉积(CVD)

摘要

Method of applying catalytically active material, especially 10 and 11 group elements (VIIIA, 1B) to heat exchanger internal surfaces. The material is applied directly to the heat exchanger surfaces without use of a carrier layer by streamless deposition (ELP) or chemical gas phase deposition (CVD). Before deposition the heat exchanger internal surfaces can be roughened by chemical acid treatment and/or oxidation.
机译:将催化活性材料特别是10和11组元素(VIIIA,1B)施加到热交换器内表面的方法。通过无流沉积(ELP)或化学气相沉积(CVD),无需使用载体层即可将材料直接应用于热交换器表面。在沉积之前,可以通过化学酸处理和/或氧化使热交换器的内表面变粗糙。

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