Micrometer and submicrometer surface height measuring apparatus for semiconductor fabrication, has spectrometer analyzing wavelength composition of light returning through coupler, and microscope providing over view of surface

摘要

The apparatus has a chromatic confocal height sensor with a light source transmitting light through a fiber optic coupler and through an afocal dispersive lens (5) and an objective lens onto a submicrometer surface. A spectrometer (2) analyzes a wavelength composition of light returning through the coupler to measure trench depth. A microscope provides an over view of the surface to measure the trench depth. An independent claim is also included for a method for measuring height characteristic in a submicrometer surface.