首页> 外国专利> Wafer testing method, involves positioning electrical contacts and mating contacts with respect to one another with assistance of optical detection of contact-making apparatus and unit under test

Wafer testing method, involves positioning electrical contacts and mating contacts with respect to one another with assistance of optical detection of contact-making apparatus and unit under test

机译:晶片测试方法,包括在光学检测接触装置和被测单元的辅助下,使电触点和配对触点相互定位。

摘要

The method involves placing one marking, which is a defined position with respect to one of electrical contacts (7), on a contact-making apparatus (1). The marking is detected optically for position determination. The electrical contacts and the mating contacts (13) are positioned with respect to one another with assistance of an optical detection of the contact-making apparatus and the unit under test e.g. wafer (10). The unit under test is moved relative to the contact-making apparatus for an alignment of the contact-making apparatus and the unit under test. Independent claims are also included for the following: (1) an apparatus for carrying out a method of electrical testing of a unit under test (2) a method for production of a contact-making apparatus.
机译:该方法包括在触点制造装置(1)上放置一个标记,该标记是相对于电触点(7)之一的限定位置。光学检测标记以确定位置。电接触件和配合接触件(13)相对于彼此定位,这是通过光学检测接触装置和被测单元(例如,接触单元)而实现的。晶片(10)。被测单元相对于接触装置移动,以使接触装置和被测单元对准。还包括以下方面的独立权利要求:(1)一种用于对被测单元进行电气测试的方法的设备(2)一种制造接触装置的方法。

著录项

  • 公开/公告号DE202005020817U1

    专利类型

  • 公开/公告日2006-11-30

    原文格式PDF

  • 申请/专利权人 FEINMETALL GMBH;

    申请/专利号DE202005020817U1

  • 发明设计人

    申请日2005-06-30

  • 分类号H01R4/00;H01R43/00;H01L21/66;G01R31/28;

  • 国家 DE

  • 入库时间 2022-08-21 20:29:06

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