首页> 外国专利> Photo mask storing and utilizing device for lithographic projection, has container with gas inflow opening, which is arranged in such a manner that flushing gas scavenges photo mask with laminar flow in case of flushing of photo mask

Photo mask storing and utilizing device for lithographic projection, has container with gas inflow opening, which is arranged in such a manner that flushing gas scavenges photo mask with laminar flow in case of flushing of photo mask

机译:用于光刻投影的光掩模存储和利用装置,具有带有气体流入开口的容器,该容器被布置成在冲洗光掩模时冲洗气体以层流方式清除光掩模。

摘要

The device has a container (30) accommodating a photo mask (5) with a container housing (32) and an opening device(34), which is closeably situated at the container housing for input and output of the photo mask. The container has a gas inflow opening (40), which is arranged in such a manner that a flushing gas scavenges the photo mask with a laminar flow in case of flushing of the photo mask. A protective foil for a gaseous material of the flushing gas is permeable to a volume.
机译:该装置具有容纳带有容器壳体(32)的光掩模(5)的容器(30)和打开装置(34),该开口装置紧密地位于容器壳体处,用于光掩模的输入和输出。所述容器具有气体流入开口(40),该气体流入开口布置成使得在冲洗光罩的情况下冲洗气体以层流的形式清除光罩。用于冲洗气体的气态材料的保护膜可渗透一定体积。

著录项

  • 公开/公告号DE202006018004U1

    专利类型

  • 公开/公告日2007-05-31

    原文格式PDF

  • 申请/专利权人 QIMONDA AG;QIMONDA RICHMOND LLC;

    申请/专利号DE202006018004U1

  • 发明设计人

    申请日2006-11-27

  • 分类号G03F1/14;G03F7/00;G03F7/20;B65D85/90;

  • 国家 DE

  • 入库时间 2022-08-21 20:28:59

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