Reflection hologram generation device of high resolution in photosensitive layer, has reflection hologram and maximum generating resolution depends upon distance between photo sensitive layer and surface of master

摘要

The device has a structure (5) of the master (3) is larger compared to the wavelength of the light of the laser light source (7). The reflecting structure of the master is applied with the reflective coating. The maximum resolution of the generated reflection hologram (RH) is depending upon the distance (d) between the photo sensitive layer (11) and the surface of the master. The beam width of the beam of rays of the laser light source and depending upon the angle between the beam of rays (9) reflected at the structure and depending upon the beam of rays sent to the master.