首页> 外国专利> Detection of low lead impurity level in transmitting optical fluoride crystal for manufacturing integrated circuit chips, by measuring transmission test wavelength through optical fluoride crystal light transmission path length

Detection of low lead impurity level in transmitting optical fluoride crystal for manufacturing integrated circuit chips, by measuring transmission test wavelength through optical fluoride crystal light transmission path length

机译:通过测量光学氟化物晶体光传输路径长度的传输测试波长,检测用于制造集成电路芯片的光学氟化物晶体传输中的低铅杂质水平

摘要

A low lead impurity level in a below 200 nm transmitting optical fluoride crystal is determined by transmitting a transmission test wavelength of 200-210 nm through below 200 nm wavelength transmitting optical fluoride crystal light transmission path length and measuring the transmission of the 200-210 nm test wavelength to provide a lead ppb impurity level measurement less than 900 ppb. Detection of a low lead impurity level in a below 200 nm transmitting optical fluoride crystal, comprises providing a below 200 nm wavelength transmitting optical fluoride crystal (20) having a crystal light transmitting path length (21). The below 200 nm wavelength transmits optical fluoride crystal light transmission path length =2 mm. A light transmission spectrophotometer is provided having a lamp for producing a transmission test wavelength of 200-210 nm and a transmission detector (28) for measuring transmission of the test wavelength. The transmission test wavelength of 200-210 nm is transmitted through below 200 nm wavelength transmitting optical fluoride crystal light transmission path length and measuring the transmission of the 200-210 nm test wavelength through the path length to provide a lead ppb impurity level measurement less than 900 ppb. An independent claim is also included for a method of making a below 200 nm wavelength optical element having an absorption coefficient at 200-210 nm of less than 0.0017 cm-1.
机译:通过在200 nm以下的透射光学氟化物晶体光透射路径长度中透射200-210 nm的透射测试波长并测量200-210 nm的透射率来确定在200 nm以下的透射光学氟化物晶体中的低铅杂质含量测试波长,以提供小于900 ppb的铅ppb杂质水平测量值。在低于200nm的透射光学氟化物晶体中检测低铅杂质水平包括提供具有晶体光透射路径长度(21)的低于200nm的波长透射光学氟化物晶体(20)。低于200 nm的波长透射的氟化物晶体的光透射路径长度> = 2 mm。提供一种光透射分光光度计,其具有用于产生200-210nm的透射测试波长的灯和用于测量测试波长的透射的透射检测器(28)。 200-210 nm的透射测试波长通过200 nm以下的波长透射光学氟化物晶体光的透射路径长度进行透射,并测量200-210 nm的测试波长通过该路径长度的透射率,以提供小于ppb的铅杂质水平测量900 ppb。还包括用于制造波长小于200nm的光学元件的方法的独立权利要求,该光学元件在200-210nm处具有小于0.0017cm-1的吸收系数。

著录项

  • 公开/公告号DE20221705U1

    专利类型

  • 公开/公告日2007-09-13

    原文格式PDF

  • 申请/专利权人 SCHOTT AG;

    申请/专利号DE2002221705U

  • 发明设计人

    申请日2002-11-19

  • 分类号G01N21/59;

  • 国家 DE

  • 入库时间 2022-08-21 20:28:53

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