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Detection of low lead impurity level in transmitting optical fluoride crystal for manufacturing integrated circuit chips, by measuring transmission test wavelength through optical fluoride crystal light transmission path length
Detection of low lead impurity level in transmitting optical fluoride crystal for manufacturing integrated circuit chips, by measuring transmission test wavelength through optical fluoride crystal light transmission path length
A low lead impurity level in a below 200 nm transmitting optical fluoride crystal is determined by transmitting a transmission test wavelength of 200-210 nm through below 200 nm wavelength transmitting optical fluoride crystal light transmission path length and measuring the transmission of the 200-210 nm test wavelength to provide a lead ppb impurity level measurement less than 900 ppb. Detection of a low lead impurity level in a below 200 nm transmitting optical fluoride crystal, comprises providing a below 200 nm wavelength transmitting optical fluoride crystal (20) having a crystal light transmitting path length (21). The below 200 nm wavelength transmits optical fluoride crystal light transmission path length =2 mm. A light transmission spectrophotometer is provided having a lamp for producing a transmission test wavelength of 200-210 nm and a transmission detector (28) for measuring transmission of the test wavelength. The transmission test wavelength of 200-210 nm is transmitted through below 200 nm wavelength transmitting optical fluoride crystal light transmission path length and measuring the transmission of the 200-210 nm test wavelength through the path length to provide a lead ppb impurity level measurement less than 900 ppb. An independent claim is also included for a method of making a below 200 nm wavelength optical element having an absorption coefficient at 200-210 nm of less than 0.0017 cm-1.
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