首页> 外国专利> interferometric measurement of ebenenabstu00e4nden with subnanometer accuracy

interferometric measurement of ebenenabstu00e4nden with subnanometer accuracy

机译:亚贝娜准确度的干涉测量法

摘要

The invention relates to a method for the interferometric determination of the change in the optical separation between two planes in a sample, on transferring from a first to a second measurement point on the sample, whereby the sample is illuminated with light of a large bandwidth and the sample is embodied to be at least partly transparent to the light and the planes to be partly reflecting. The method comprises the steps: spectral splitting of the interference in the light beams reflected from the planes at both measurement points, determination of the modulation frequencies and phase positions of the spectrograms and generation of the differences for said results, drawing an inference of a first value for the optical separation change of the planes from the difference of the modulation frequencies alone and calculation of a second more accurate value for the optical separation change from the first value, by taking into account the phase difference.
机译:本发明涉及一种在从样品上的第一测量点到第二测量点转移时,用干涉法测定样品中两个平面之间的光学距离变化的方法,从而用大带宽的光照射样品。样品被实施为至少部分地对光透明并且平面被部分反射。该方法包括以下步骤:在两个测量点处从平面反射的光束中的干涉进行光谱分裂,确定频谱图的调制频率和相位位置,以及为所述结果生成差异,得出第一个结论。通过仅考虑调制信号的相位差,就可以根据平面的不同来确定平面的光学分离变化的值,并且可以根据第一值来计算用于光学分离的第二更准确的值。

著录项

  • 公开/公告号DE502004002197D1

    专利类型

  • 公开/公告日2007-01-11

    原文格式PDF

  • 申请/专利权人 UNIVERSITAET ZU LUEBECK;

    申请/专利号DE20045002197T

  • 发明设计人 KOCH PETER;KOCH EDMUND;

    申请日2004-06-14

  • 分类号G01B11/06;

  • 国家 DE

  • 入库时间 2022-08-21 20:28:46

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号