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Method for the rapid simulation and adaptation of the x-ray spectra of superlattices

机译:快速模拟和适应超晶格x射线光谱的方法

摘要

A method of simulation and/or fitting of X-ray scattering patterns comprising X-ray reflection and X-ray diffraction from multilayers with N repeating basic periods of a superlattice comprising a number L of single layers within each basic period, on a substrate, comprises the following steps:a) introducing the scattering matrix (SM) of one basic period of the superlattice, wherein the scattering matrix consists of the product of the scattering matrices of the single layers within the basic period;b) construction of superlattice eigenwaves using diagonalisation of the scattering matrix;c) using the superlattice eigenwaves to obtain an analytical representation of the wavefield and a solution of the boundary problem for the finite number N of basic periods of the superlattice;d) calculation of the intensity distribution of the scattering patterns by an analytical formula based on step c).;This allows the calculation of an X-ray scattering pattern of a periodically multilayered film sample on a substrate which is fast and simple to carry out.
机译:一种在基板上模拟和/或拟合X射线散射图案的方法,该方法包括从具有N个重复基本周期的超晶格的多层中进行X射线反射和X射线衍射的超晶格,该超晶格在每个基本周期内包含L个单层。包括以下步骤: a)引入超晶格一个基本周期的散射矩阵(SM),其中散射矩阵由散射矩阵的乘积组成基本周期内的单层层数; b)使用散射矩阵的对角线构造超晶格本征波; c)使用超晶格本征波获得波场的解析表示并解决了有限个N个超晶格基本周期的边界问题; d)通过基于步骤c)的解析公式计算散射图案的强度分布。 ;这可以计算出基板上周期性多层膜样品的X射线散射图,该图快速且易于执行。

著录项

  • 公开/公告号DE60304241T2

    专利类型

  • 公开/公告日2006-12-28

    原文格式PDF

  • 申请/专利权人

    申请/专利号DE2003604241T

  • 发明设计人

    申请日2003-04-16

  • 分类号G01N23/20;

  • 国家 DE

  • 入库时间 2022-08-21 20:27:46

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