首页> 外国专利> Process for the removal of iodide - and / or silicate anions from salt solutions by anion exchange for the electrolysis on zirconium hydroxide

Process for the removal of iodide - and / or silicate anions from salt solutions by anion exchange for the electrolysis on zirconium hydroxide

机译:通过阴离子交换在氢氧化锆上电解从盐溶液中除去碘和/或硅酸盐阴离子的方法

摘要

PROBLEM TO BE SOLVED: To efficiently remove iodine and silica ions which are contained in saline water containing impurity ions and affect an electrolytic treatment by subjecting the saline water and zirconium hydroxide to a contact treatment under acidity. ;SOLUTION: Saline water containing iodine and the silica ions and a zirconium hydroxide are subjected to a contact treatment under acidity, by which the iodine and/or the silica ions are adsorbed away. The zirconium hydroxide adsorbing the iodine and the silica ions and the aqueous solution are brought into contact at a pH value higher than the pH value in an adsorption stage, by which the adsorbed iodine and the silica ions are desorbed. The adsorption and the desorption are preferably respectively continuously carried out with the single treating vessel or are respectively continuously carried out with separate treating vessels to circulate the zirconium hydroxide between the respective stages. Further, the pretreatment to convert the neutral silica and/or colloidal silica contained in the saline water is preferably executed.;COPYRIGHT: (C)2000,JPO
机译:解决的问题:通过使盐水和氢氧化锆在酸性下进行接触处理,以有效地去除包含杂质离子的盐水中所含的碘和硅离子并影响电解处理。 ;解决方案:在酸性条件下,将含有碘和二氧化硅离子的盐水与氢氧化锆进行接触处理,从而将碘和/或二氧化硅离子吸附掉。在吸附阶段,使吸附碘和二氧化硅离子的氢氧化锆与水溶液在高于pH值的pH值下接触,从而使吸附的碘和二氧化硅离子解吸。吸附和解吸优选分别在单个处理容器中连续进行或分别在单独的处理容器中连续进行,以使氢氧化锆在各个阶段之间循环。此外,优选进行将盐水中所含的中性二氧化硅和/或胶体二氧化硅转化的预处理。COPYRIGHT:(C)2000,JPO

著录项

  • 公开/公告号DE69934640T2

    专利类型

  • 公开/公告日2007-10-25

    原文格式PDF

  • 申请/专利权人

    申请/专利号DE1999634640T

  • 发明设计人

    申请日1999-08-24

  • 分类号C01D3/16;C01D3/14;

  • 国家 DE

  • 入库时间 2022-08-21 20:27:19

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