首页> 外国专利> Deposition of silver or silver alloy nanoparticles on substrate comprises use of organometallic precursors and deposition carried out in presence of reactive oxidant gas

Deposition of silver or silver alloy nanoparticles on substrate comprises use of organometallic precursors and deposition carried out in presence of reactive oxidant gas

机译:银或银合金纳米颗粒在基材上的沉积包括使用有机金属前体和在反应性氧化剂气体存在下进行的沉积

摘要

Coating a substrate with silver or silver alloy nanoparticles by chemical vapor deposition (CVD) uses at least one silver organometallic precursor and deposition carried out in the presence of a gas comprising at least 50% of a reactive oxidant gas selected from oxygen, carbon dioxide, ozone and mixtures of these. Coating a substrate with silver or silver alloy nanoparticles by chemical vapor deposition (CVD) uses at least one silver organometallic precursor and deposition carried out in the presence of a gas comprising at least 50%, preferably 70-100%, of a reactive oxidant gas selected from oxygen, carbon dioxide, ozone and mixtures of these. The gas can be a mixture of an oxidant gas and an inert gas such as argon, nitrogen, helium or mixtures of these, with the oxidant gas comprising more than 50% of the gas mixture. The silver alloy contains at least one element selected from other metals such as platinum, palladium, rhodium or iridium, and carbon, and the organometallic precursors are selected from carboxylates and beta-dicetonates of metals.
机译:通过化学气相沉积(CVD)用银或银合金纳米粒子涂覆基材,使用至少一种有机银金属前体,并在包含至少50%的活性氧化剂气体的气体存在下进行沉积,所述活性氧化剂气体选自氧气,二氧化碳,臭氧及其混合物。通过化学气相沉积(CVD)用银或银合金纳米颗粒涂覆基材使用至少一种有机银金属前体,并在包含至少50%,优选70-100%的反应性氧化剂气体的气体存在下进行沉积选自氧气,二氧化碳,臭氧及其混合物。该气体可以是氧化剂气体和惰性气体如氩气,氮气,氦气或它们的混合物的混合物,其中氧化剂气体占气体混合物的50%以上。所述银合金包含选自其他金属如铂,钯,铑或铱和碳的至少一种元素,并且所述有机金属前体选自金属的羧酸盐和β-二癸酸盐。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号