PROBLEM TO BE SOLVED: To provide an alkali-developable resin composition which is excellent in sensitivity, alkali resistance, electrical properties, etc. and is capable of forming a fine pattern with a high precision, and an alkali-developable photosensitive resin composition.;SOLUTION: A phenolic resin (A) is prepared by reacting a compound of formula (I) with an aldehyde compound or a derivative thereof, a compound of formula (II) or a compound of formula (III) or (III') and an aldehyde compound or a derivative thereof. An epoxy resin (B) is prepared by subjecting a phenolic hydroxyl group of the phenolic resin (A) to glycidyl etherification. The alkali-developable resin composition comprises a photopolymerizable unsaturated compound obtained by imparting an ethylenically unsaturated bond to the epoxy resin (B). The alkali-developable photosensitive resin composition is prepared by adding a photopolymerization initiator and a color material to the alkali-developable resin composition.;COPYRIGHT: (C)2008,JPO&INPIT
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