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Epoxy resins, alkali-developable resin composition and alkali-developable photosensitive resin composition

机译:环氧树脂,可碱显影的树脂组合物和可碱显影的光敏树脂组合物

摘要

PROBLEM TO BE SOLVED: To provide an alkali-developing resin composition and alkali-developing photosensitive resin composition excellent in sensitivity, resolution, developing properties, adhesion and the like and forming precisely fine patterns.;SOLUTION: This alkali-developing resin composition comprises a photopolymerizable unsaturated compound obtained by adding an unsaturated monobasic acid to an epoxy resin (A) having a structure obtained by alternate-copolymerizing 1,1-bis(4'-epoxypropyloxyphenyl)-1-phenyl-1-cyclohexylmethane or a derivative thereof which is an epoxy compound and a polyhydroxy aromatic compound and further by esterifying the above-obtained adduct of the epoxy resin (A) with a polybasic acid anhydride.;COPYRIGHT: (C)2007,JPO&INPIT
机译:解决的问题:提供一种在灵敏度,分辨率,显影性能,粘合性等方面优异并且形成精确的精细图案的碱显影树脂组合物和碱显影感光性树脂组合物;解决方案:该碱显影树脂组合物包含通过将不饱和一元酸加到环氧树脂中的光聚合不饱和化合物,该环氧树脂具有通过交替共聚1,1-双(4'-环氧丙氧基苯基)-1-苯基-1-环己基甲烷或其衍生物而获得的结构环氧化合物和多羟基芳香族化合物,再将上述获得的环氧树脂(A)加合物与多元酸酐酯化。;版权所有:(C)2007,日本特许厅&INPIT

著录项

  • 公开/公告号JP4878876B2

    专利类型

  • 公开/公告日2012-02-15

    原文格式PDF

  • 申请/专利权人 株式会社ADEKA;

    申请/专利号JP20060070363

  • 发明设计人 佐藤 直美;藤上 和生文;

    申请日2006-03-15

  • 分类号C08G59/14;G03F7/027;C08F299/00;H05K1/03;

  • 国家 JP

  • 入库时间 2022-08-21 17:37:27

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