PLASMA REACTOR WITH ION DISTRIBUTION UNIFORMITY CONTROLLER EMPLOYING MULTIPLE VHF SOURCES

摘要

PROBLEM TO BE SOLVED: To provide a plasma reactor with high ion distribution uniformity, which employs capacitive-coupled plasma of high frequency.;SOLUTION: A plasma reactor comprises a ceiling electrode facing a workpiece support pedestal, a pedestal electrode in the pedestal, and first and second VHF power sources of different frequencies coupled to the same one or to different ones of the ceiling electrode and the pedestal electrode. The first and second VHF power sources are of sufficiently high and sufficiently low frequencies respectively to produce center-high and center-low plasma distribution nonuniformities respectively in a chamber. The reactor further comprises a controller programmed to change the relative output power levels of the first and second VHF power sources so as to: (a) increase the relative output power level of the first VHF power source when plasma ion distribution has a predominantly edge-high nonuniformity; and (b) increase the relative output power level of the second VHF power source when plasma ion distribution has a predominantly center-high nonuniformity.;COPYRIGHT: (C)2009,JPO&INPIT