Use of Multiple 4 pi Radiation Sources for Quasi-Uniform Irradiation of Circular Surfaces

摘要

The problem of optimally locating multiple 4 pi radiation sources in relation to circular planar targets is addressed, with the constraint that the surface be irradiated with 80 percent uniformity. The optimum source-location coordinates and the resulting target flux patterns are presented for a number of source arrays. They are compared to the results of a similar study for quasi-uniform irradiation of square surfaces. (ERA citation 01:025036)