首页> 外国专利> PHOTOSENSITIVE POLYIMIDE COMPOSITION, PREPARATION METHOD OF SOLUBLE POLYIMIDE RESIN AND PREPARATION METHOD OF PHOTOSENSITIVE POLYIMIDE COMPOSITION

PHOTOSENSITIVE POLYIMIDE COMPOSITION, PREPARATION METHOD OF SOLUBLE POLYIMIDE RESIN AND PREPARATION METHOD OF PHOTOSENSITIVE POLYIMIDE COMPOSITION

机译:光敏性聚酰亚胺组合物,可溶性聚酰亚胺树脂的制备方法和光敏性聚酰亚胺组合物的制备方法

摘要

PROBLEM TO BE SOLVED: To provide a photosensitive polyimide composition which is capable of forming a protective film that hardly deteriorates in a gold plating process and exerts a sufficient adhesion to a copper foil, retains a developability equivalent to those in conventional techniques and hardly causes problems such as residues, a preparation method of a soluble polyimide resin used as a component thereof, and a preparation method of the photosensitive polyimide composition.;SOLUTION: The photosensitive polyimide composition contains the soluble polyimide resin and a positive sensitizer, provided that the soluble polyimide resin is a condensation product of an aromatic tetracarboxylic acid dianhydride and a diamine, and the diamine comprises a silicone diamine and a diamine having a hydroxyl group. The weight average molecular weight of the soluble polyimide resin is 20,000-50,000 and exerts a unimodal molecular weight distribution with a variance of ≤2.0.;COPYRIGHT: (C)2008,JPO&INPIT
机译:解决的问题:提供一种感光性聚酰亚胺组合物,该组合物能够形成在镀金工序中几乎不劣化并且对铜箔具有充分的密合性的保护膜,并且保持与传统技术相同的显影性并且几乎不引起问题溶液:感光性聚酰亚胺组合物包含可溶性聚酰亚胺树脂和正型敏化剂,但前提是可溶性聚酰亚胺树脂是芳族四羧酸二酐和二胺的缩合产物,并且二胺包括硅氧烷二胺和具有羟基的二胺。可溶性聚酰亚胺树脂的重均分子量为20,000-50,000,并表现出单峰分子量分布,差异为≤ 2.0。; COPYRIGHT:(C)2008,JPO&INPIT

著录项

  • 公开/公告号JP2008195892A

    专利类型

  • 公开/公告日2008-08-28

    原文格式PDF

  • 申请/专利权人 SUMITOMO ELECTRIC IND LTD;

    申请/专利号JP20070034945

  • 申请日2007-02-15

  • 分类号C08L79/08;G03F7/023;C08K5/42;C08G73/10;

  • 国家 JP

  • 入库时间 2022-08-21 20:24:40

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