Fe-Co ALLOY SPUTTERING TARGET MATERIAL, AND METHOD FOR MANUFACTURING Fe-Co ALLOY SPUTTERING TARGET MATERIAL

摘要

PROBLEM TO BE SOLVED: To provide an Fe-Co alloy sputtering target material by which machinability of an Fe-Co alloy sputtering target material for deposition of soft magnetic films used for a perpendicular magnetic recording medium can be improved and sputtering of the soft magnetic films can be stably done.;SOLUTION: The Fe-Co alloy sputtering target material is a sintered target material in which one or two elements M1 selected between Nb and Ta, in a content not lower than that of eutectic composition with Fe, are contained in an Fe-Co alloy having a composition formula in atomic ratio represented by Fe_X-Co_100-X (where 20≤X≤70 is satisfied) and has ≤37 HS Shore hardness.;COPYRIGHT: (C)2009,JPO&INPIT