FE-CO ALLOY SPUTTERING TARGET MATERIAL AND METHOD FOR PRODUCING SAME, AND SOFT MAGNETIC THIN FILM LAYER AND PERPENDICULAR MAGNETIC RECORDING MEDIUM USING SAME

摘要

PROVIDED IS A FE-CO ALLOY SPUTTERING TARGET MATERIAL THAT DOES NOT CRACK DURING SPUTTERING. THIS FE-CO ALLOY SPUTTERING TARGET MATERIAL IS COMPOSED OF A FE-CO-M ALLOY REPRESENTED BY FORMULA (1): (Fex-Co100-x)100-yMy … (1) WHERE THE ATOMIC RATIOS ARE 0 ≤ X ≤ 100 AND 4 ≤ Y ≤ 28, AND THE ELEMENT M INCLUDES AT LEAST ONE ELEMENT SELECTED FROM NB, TA, MO, W, CR, AND V. THE SPUTTERING TARGET MATERIAL HAS A MICROSTRUCTURE INCLUDING A PHASE BASED ON FE AND CO AND AN INTERMETALLIC COMPOUND PHASE CONTAINING THE ELEMENT M AND AT LEAST ONE OF FE AND CO. THE AREA RATIO OF A EUTECTIC STRUCTURE IN THE OVERALL MICROSTRUCTURE IS 30% OR LESS. FIG. 2