HEATING DEVICE OF LIGHT IRRADIATION TYPE AND HEATING METHOD OF LIGHT IRRADIATION TYPE

摘要

PROBLEM TO BE SOLVED: To improve the uniformity of illumination distribution on the surface of a workpiece without increasing the number of zones even for a spike annealing step.;SOLUTION: A plurality of lamps 1 are arranged in parallel, plane mirrors 2 are provided above the lamps 1, and guard rings 5 are arranged around a workpiece. The lamps 1 are comprised of I, II and III groups, and injection energy to the lamps 1 belonging to the III group is larger than those to the lamps 1 belonging to the I and II groups. A diffusion mirror 21 is located in the upper part corresponding to a workpiece 6 of the plane mirror 2, and light that is emitted from the lamp 1 belonging to the I and II groups and reflected on the reflection mirror 2 is given as diffused light to the work 6, thus improving the uniformity of illumination distribution on the surface of the wafer. In addition, there hardly exists light emitted from the lamps 1 belonging to the III group reflected on the diffusion mirror 21, thus keeping appropriate separation between the II group and the III group.;COPYRIGHT: (C)2008,JPO&INPIT