METHOD FOR MONITORING AND OPTIMIZING PROCESS IN-SITU, EX-SITU AND IN-LINE AND MANUFACTURING METHOD THEREFOR

摘要

PPROBLEM TO BE SOLVED: To provide a method for monitoring and optimizing a process related to a semiconductor device and its components in-situ, ex-situ and in-line. PSOLUTION: The method and a system for controlling, monitoring, optimizing and manufacturing a device and its components and related base members on a semiconductor in an in-situ process includes a light irradiation system and an electric probe circuit. The light irradiation system includes a light source and a detector for measuring optical characteristics of the base members in-situ. A voltage and a current are applied by the electric probe circuit. The electric probe circuit measures changes of electric characteristics of the base members caused by light irradiation, the voltage and/or the current. The in-situ process is controlled by optical and electrical measurement. PCOPYRIGHT: (C)2009,JPO&INPIT