RF POWER SOURCE SYSTEM, AND PLASMA CHAMBER USING THE RF POWER SOURCE SYSTEM

摘要

PROBLEM TO BE SOLVED: To provide an RF power source system which remarkably reduces user costs, also improves reliability and satisfies different applications, technical processes and the like, and to provide a plasma chamber using the RF power source system.;SOLUTION: RF signal generators 325, 330, 335 output RF signals whose frequencies are f1, f2, f3 and transmit the RF signals to a wide-band power amplifier 360 after combining them by a combiner 355. The wide-band power amplifier 360 amplifies the combined RF signal and outputs one RF signal having combined and amplified three frequencies f1, f2, f3. A low-pass filter 365, a band-pass filter 370 and a high-pass filter 380 are then utilized for the combined and amplified RF signal and different frequency outputs are determined. Thus, only by using one amplifier, the system provides three RF power signals.;COPYRIGHT: (C)2009,JPO&INPIT