首页> 外国专利> METHOD AND DEVICE FOR MEASURING METAL OXIDATION DEGREE OF METAL VAPOR-DEPOSITED FILM, AND METHOD AND DEVICE FOR MEASURING FILM THICKNESS

METHOD AND DEVICE FOR MEASURING METAL OXIDATION DEGREE OF METAL VAPOR-DEPOSITED FILM, AND METHOD AND DEVICE FOR MEASURING FILM THICKNESS

机译:测量金属气相沉积膜的金属氧化程度的方法和装置,以及测量膜厚度的方法和装置

摘要

PROBLEM TO BE SOLVED: To enable the oxidation degree of a metal vapor-deposited film to be measured independently of a film thickness.;SOLUTION: In a metal vapor-deposited film forming device, a film (3) for vapor deposition uncoiled from an uncoiling roll (2) is coiled around a cooling roll (4) at a predetermined angle, vapor-deposited with a metal vapor, and coiled around a coiling roll (5), and oxygen is fed to the metal vapor from upstream and downstream sides. A surface reflectance sensor (10) and a transmittance sensor (11) are arranged between the coiling roll (5) and the cooling roll (4) close to the surface of the film (3) for vapor deposition, and the oxidation degree of the metal in the metal vapor-deposited film is calculated from the detected values of the surface reflectance sensor (10) and the transmittance sensor (11) without depending on the thickness of the metal vapor-deposited film.;COPYRIGHT: (C)2008,JPO&INPIT
机译:解决的问题:为了能够独立于膜厚来测量金属气相沉积膜的氧化度。解决方案:在金属气相沉积膜形成装置中,用于气相沉积的膜(3)从膜上未卷曲。开卷辊(2)以预定角度绕冷却辊(4)盘绕,沉积有金属蒸气,然后绕盘绕辊(5)盘绕,从上游侧和下游侧向金属蒸气供给氧气。在卷绕膜(3)的表面附近,在卷取辊(5)和冷却辊(4)之间配置有表面反射率传感器(10)和透射率传感器(11),氧化膜的氧化度高。根据表面反射率传感器(10)和透射率传感器(11)的检测值计算出金属蒸镀膜中的金属,而与金属蒸镀膜的厚度无关。COPYRIGHT:(C)2008,日本特许厅

著录项

  • 公开/公告号JP2008038198A

    专利类型

  • 公开/公告日2008-02-21

    原文格式PDF

  • 申请/专利权人 SONY CORP;

    申请/专利号JP20060213696

  • 申请日2006-08-04

  • 分类号C23C14/54;C23C14/56;

  • 国家 JP

  • 入库时间 2022-08-21 20:22:58

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