PHOTOTOOL FOR SOLDER RESIST EXPOSURE AND SOLDER RESIST PATTERN FORMING METHOD IN WHICH EXPOSURE PROCESSING IS PERFORMED USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a phototool for exposure processing of solder resist with which a high-resolution resist pattern can be formed with good reproducibility regardless of the thickness of a solder resist layer and the influence of a blue pigment, and to provide a solder resist pattern forming method in which exposure processing is performed using the phototool, and a photosensitive composition suitable for use in the forming method.;SOLUTION: The phototool is used in exposure processing in pattern formation of solder resist and has a photomask, wherein the phototool cuts off ≥50% of light of ≤370 nm and transmits ≥80% of light of ≥400 nm.;COPYRIGHT: (C)2008,JPO&INPIT