EXPOSURE MARGIN CALCULATION METHOD, EXPOSURE EVALUATION DEVICE, AND EXPOSURE EVALUATION PROGRAM

摘要

PROBLEM TO BE SOLVED: To provide an exposure margin calculation method capable of calculating an exposure margin of various shapes and exposure patterns of arbitrary dimensions, and to provide an exposure evaluation device and an exposure evaluation program.;SOLUTION: The method includes steps of: obtaining, for each exposure D, a plurality of images of an exposure pattern formed on an object to be exposed such as a semiconductor wafer W through an exposure step; processing the images of the exposure pattern to calculate, for each exposure D, an outer peripheral length L of the exposure pattern; comparing the outer peripheral length L with the outer peripheral length L0 of a design pattern to calculate, for each exposure, an outer peripheral length difference dL, which is a difference between them; and calculating an exposure margin An.;COPYRIGHT: (C)2008,JPO&INPIT