METHOD OF DEPSOTING NANODIAMOND/AMORPHOUS CARBON COMPOSITE FILM USING PLASMA CVD METHOD

摘要

PROBLEM TO BE SOLVED: To provide a method of depositing a nanodiamond/amorphous carbon composite film using a plasma CVD system by which the nanodiamond/amorphous carbon composite film is surely deposited in a short period of time using acetylene as a gaseous starting material.;SOLUTION: In a pretreatment, the surface of a silicon single crystal substrate 13 is carbonized to form a carbonized layer. After that, the surface of the carbonized layer is subjected to a scratch treatment using diamond particles. The nanodiamond/amorphous carbon composite film is deposited on the surface of the scratched carbonized layer by the plasma CVD system using acetylene as the gaseous starting material.;COPYRIGHT: (C)2008,JPO&INPIT