首页> 外国专利> VANE CLUSTER PROVIDED WITH COATED METALLIC SUBSTRATE, METHOD FOR MANUFACTURING VANE CLUSTER, AND METHOD FOR DESIGNING VANE CLUSTER

VANE CLUSTER PROVIDED WITH COATED METALLIC SUBSTRATE, METHOD FOR MANUFACTURING VANE CLUSTER, AND METHOD FOR DESIGNING VANE CLUSTER

机译:涂有金属基材的叶片簇,叶片簇的制造方法和叶片簇的设计方法

摘要

PPROBLEM TO BE SOLVED: To provide a method for locally cooling a region where thickness of coating is thin in a coated vane cluster. PSOLUTION: A vane cluster has a coated metallic substrate. The cluster includes a platform and a shroud. At least first and second airfoils 62, 64 extend between an outer face of the platform and an inner face of the shroud. Each airfoil has a pressure side and a suction side. The pressure side of the first airfoil 62 faces the suction side of the second airfoil. At least a first side selected from the pressure side of the first airfoil 62 and the suction side of the second airfoil 64 includes a first region with a local thinning or gap in the coating. Along the first side, a cooling passageway system includes means for locally cooling the first region. PCOPYRIGHT: (C)2008,JPO&INPIT
机译:

要解决的问题:提供一种局部冷却涂覆的叶片簇中涂层厚度薄的区域的方法。

解决方案:叶片簇具有涂层金属基底。该集群包括一个平台和一个防护罩。至少第一翼型件62和第二翼型件64在平台的外表面和护罩的内表面之间延伸。每个翼型件具有压力侧和吸入侧。第一翼型件62的压力侧面对第二翼型件的吸入侧。从第一翼型件62的压力侧和第二翼型件64的吸力侧中选择的至少第一侧包括在涂层中具有局部变薄或间隙的第一区域。沿着第一侧,冷却通道系统包括用于局部冷却第一区域的装置。

版权:(C)2008,日本特许厅&INPIT

著录项

  • 公开/公告号JP2008101607A

    专利类型

  • 公开/公告日2008-05-01

    原文格式PDF

  • 申请/专利权人 UNITED TECHNOL CORP UTC;

    申请/专利号JP20070210704

  • 发明设计人 CHON YOUNG H;

    申请日2007-08-13

  • 分类号F01D9/02;F02C7/18;

  • 国家 JP

  • 入库时间 2022-08-21 20:21:26

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