首页> 外国专利> METHOD OF MANUFACTURING ANTIREFLECTION STRUCTURAL BODY, MOLDING DIE USING ANTIREFLECTION STRUCTURAL BODY AND METHOD OF MANUFACTURING GLASS FORMED ARTICLE OR RESIN MOLDED ARTICLE

METHOD OF MANUFACTURING ANTIREFLECTION STRUCTURAL BODY, MOLDING DIE USING ANTIREFLECTION STRUCTURAL BODY AND METHOD OF MANUFACTURING GLASS FORMED ARTICLE OR RESIN MOLDED ARTICLE

机译:制造抗弯结构体的方法,使用抗弯结构体模制模具以及制造玻璃制成的模制件或树脂模制件的方法

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing an antireflection structural body easily and inexpensively.;SOLUTION: An X-ray sensitive film 11 is formed on a substrate 10. A plurality of particulate bodies 12 which shield X-ray are arranged on the X-ray sensitive film 11 with a pitch of light wavelength or less where light reflection is suppressed by a light reflection preventive rugged structure. The X-ray sensitive film 11 is irradiated with X-ray from above a mask layer 15, and then developed, thereby the X-ray sensitive film 11 is patterned into a prescribed pattern. The substrate 10 is etched from above the patterned X-ray sensitive film 11, thereby, the light reflection preventive rugged structure is formed on the substrate 10 for obtaining the antireflection structural body 1.;COPYRIGHT: (C)2008,JPO&INPIT
机译:解决的问题:提供一种容易且廉价地制造防反射结构体的方法。解决方案:在基板10上形成X射线敏感膜11。在其上布置多个屏蔽X射线的颗粒体12。 X射线敏感膜11具有光波长间距或更小,其中通过防止光反射的坚固结构来抑制光反射。从掩模层15上方对X射线敏感膜11照射X射线,然后显影,从而将X射线敏感膜11构图成预定图案。从图案化的X射线敏感膜11的上方蚀刻基板10,从而在基板10上形成防止光反射的凹凸结构,以获得抗反射结构体1 。;版权所有:(C)2008,JPO&INPIT

著录项

  • 公开/公告号JP2007333882A

    专利类型

  • 公开/公告日2007-12-27

    原文格式PDF

  • 申请/专利权人 MATSUSHITA ELECTRIC IND CO LTD;

    申请/专利号JP20060163731

  • 发明设计人 TAMURA TAKAMASA;UMETANI MAKOTO;

    申请日2006-06-13

  • 分类号G02B1/11;

  • 国家 JP

  • 入库时间 2022-08-21 20:20:54

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