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Analysis method of thin film three-layer structure using a spectroscopic ellipsometer
Analysis method of thin film three-layer structure using a spectroscopic ellipsometer
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机译:光谱椭偏仪分析薄膜三层结构的方法
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摘要
PROBLEM TO BE SOLVED: To provide a method for measuring and analyzing a thin film three-layer structure by using a spectroscopic ellipsometer.;SOLUTION: This method for measuring and analyzing a thin film three-layer structure is a method for analyzing a thin film three-layer structure by using the spectroscopic ellipsometer in case where first and third layers among thin-film three layers on a substrate include an optical constant common to both while a second layer has a different optical constant. This method comprises: a spectrometry phase 10 for obtaining measurement data by using the spectroscopic ellipsometer; a case determination phase 20 for selecting a case based on known information; an analysis phase 1 for determining an initial model for the three-layer structure; an analysis phase 2 for determining an optical constant and a film thickness on each layer on the initial model; and an analysis phase 3 for performing final fitting on the model obtained in the phase 2 and ascertaining its result for storing.;COPYRIGHT: (C)2005,JPO&NCIPI
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