Indirect conduction type continuous electrolytic etching apparatus and indirect conduction type continuous electrolytic etching method of low iron loss grain oriented silicon steel sheet

摘要

PROBLEM TO BE SOLVED: To provide an indirect conductive type continuous electrolytic etching method and an indirect conductive type continuous electrolytic etching apparatus for a metallic strip.;SOLUTION: In the indirect conductive type continuous electrolytic etching method and apparatus for a metallic strip, a metallic strip in which an etching pattern is imparted to both sides or one side to form an etching mask is continuously subjected to groove working by indirect conductive type electrolytic etching. A plurality of electrodes are arranged in the order of A system, B system, A system, B system,... to the progressing direction of the metallic strip so as to mutually be confronted with the etching face in which the etching pattern is formed in the metallic strip. An electric solution is filled into the space between the metallic strip and the electrode groups. Then, (I) voltage application by which the A system electrode is made into the cathode while a time M is 3-10 msec, and (II) voltage application by which the A system electrode is made into the anode while a time N is 4-20 Mmsec, are alternatively repeated between the A system electrodes and the B system electrodes.;COPYRIGHT: (C)2004,JPO