It is low, iron loss one side direct electrification type continual electrolytic etching manner and direct electrification type continual electrolytic etching device null of the tropistic silicon

摘要

PROBLEM TO BE SOLVED: To provide a direct energizing type continuous electrolytic etching method and a direct energizing type continuous electrolytic etching apparatus for a metallic strip.;SOLUTION: In the direct energizing type continuous electrolytic etching method and apparatus for a metallic strip, a metallic strip in which an etching pattern is imparted to the surface on one side to form an etching mask, and the surface on the remaining side is an electroconductive body is continuously subjected to groove working by direct energizing type electrolytic etching. Then, an electrolytic solution is filled into the space between electrodes arranged so as to mutually be confronted with the etching face of the metallic strip. A conductor roll is brought into contact with the another surface on which the etching mask is not formed in the metallic strip, and (I) voltage application for a time M=3 to 10 msec in which the conductor roll side is used as the cathode, and the electrode side is used as the anode, and (II) voltage application for a time N=4 M to 20 Mmsec in which the conductor side is used as the anode, and the electrode side is used as the cathode are alternately repeated.;COPYRIGHT: (C)2004,JPO