FLAW INSPECTION DEVICE, PROGRAM THEREOF, RECORDING MEDIUM, FLAW INSPECTION SYSTEM AND FLAW INSPECTION METHOD

摘要

PROBLEM TO BE SOLVED: To accurately and easily detect the flaw of a photomask that requires correction.;SOLUTION: A flaw inspection device includes a data-acquisition part 11 for acquiring the optical image data of a predetermined region, which includes light-transmitting region and light-shielding region of a mask pattern from an image sensor 7, a data detection part 12 for detecting the density of flaws that are the number of flaws in the predetermined region, along with the shape and flaw data of the mask pattern from the acquired optical image data and an operation part 13 for determining whether the correction of the flaw of the mask pattern detected by the data detection part 12 is required, on the basis of the shape and flaw data of the detected mask pattern and the density data of the flaw.;COPYRIGHT: (C)2008,JPO&INPIT