首页> 外国专利> METHOD OF MANUFACTURING MICROLENS FOR COLOR IMAGING ELEMENT AND MICROLENS ARRAY FOR COLOR IMAGING ELEMENT

METHOD OF MANUFACTURING MICROLENS FOR COLOR IMAGING ELEMENT AND MICROLENS ARRAY FOR COLOR IMAGING ELEMENT

机译:制造用于彩色成像元件的微镜和用于彩色成像元件的微镜阵列的方法

摘要

PROBLEM TO BE SOLVED: To provide a method of manufacturing a microlens for a color imaging element by which manufacture cost can be reduced without lowering optical performance of the microlens directly formed on a color filter and to provide a microlens array which can sufficiently function between adjoining microlenses.;SOLUTION: In the method of manufacturing the microlens for the color imaging element, a color filter layer 18 is formed on a flattening layer 16 formed on a photoelectric conversion element 12 in a semiconductor substrate 10 of the imaging element 14, then a photosensitive lens material layer 20 is formed on the filter layer. The lens material layer is subjected to pattern exposure by using a photomask 24 with controlled transmittance distribution so that microlenses 22g, 22b and 22r may be formed on the corresponding photoelectric conversion element after development and then is subjected to development and hardening to form the microlens on the corresponding photoelectric conversion element. The microlens array 28 containing a plurality of the microlenses is manufactured by the above-mentioned manufacturing method.;COPYRIGHT: (C)2008,JPO&INPIT
机译:解决的问题:提供一种用于制造彩色成像元件的微透镜的方法,通过该方法可以降低制造成本而不会降低直接形成在滤色器上的微透镜的光学性能,并提供一种在相邻之间能够充分起作用的微透镜阵列。解决方案:在制造用于彩色成像元件的微透镜的方法中,在成像元件14的半导体衬底10中的光电转换元件12上形成的平坦化层16上形成滤色器层18,然后光敏透镜材料层20形成在滤光层上。通过使用具有受控的透射率分布的光掩模24对透镜材料层进行图案曝光,使得可以在显影后在相应的光电转换元件上形成微透镜22g,22b和22r,然后进行显影和硬化以在其上形成微透镜。相应的光电转换元件。通过上述制造方法来制造包含多个微透镜的微透镜阵列28。版权所有:(C)2008,JPO&INPIT

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