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In the ingot growth device which grows the monocrystal silicon ingot from the monocrystal silicon ingot growth device and

机译:在从单晶硅锭生长装置生长单晶硅锭的锭生长装置中,

摘要

PROBLEM TO BE SOLVED: To provide a coating material having high emissivity and capable of strongly sticking on stainless steel over the wide range of from room temperature to high temperature (100°C).;SOLUTION: The coating material for absorbing radiation heat is manufactured by mixing and agitating 10-15 wt.% silica, 5-10 wt.% graphite, and 75-85 wt.% IPA. In a sealed furnace or ingot growing equipment, there is comprised of a quartz crucible, a heating device, an ingot pull up device, a heat shield for keeping temperature distribution of coagulation boundary face constant, and a cooling device, and further more an ingot cooling means for cooling the growing silicon ingot by absorbing radiation heat radiated from the ingot. The ingot cooling means is provided with a circulation cooling tube, the outer surface of which is coated with the radiation absorbing layer.;COPYRIGHT: (C)2003,JPO
机译:解决的问题:提供一种具有高发射率并且能够在从室温到高温(100℃)的宽范围内牢固地粘附在不锈钢上的涂料;解决方案:制造用于吸收辐射热的涂料通过混合和搅拌10-15重量%的二氧化硅,5-10重量%的石墨和75-85重量%的IPA。在密闭式炉或铸锭生长设备中,包括石英坩埚,加热装置,铸锭提拉装置,用于使凝固界面的温度分布保持恒定的隔热罩,冷却装置,以及铸锭。冷却装置,用于通过吸收从晶锭辐射的辐射热来冷却生长的硅锭。铸锭冷却装置设置有循环冷却管,该循环冷却管的外表面覆盖有放射线吸收层。; COPYRIGHT:(C)2003,JPO

著录项

  • 公开/公告号JP4162950B2

    专利类型

  • 公开/公告日2008-10-08

    原文格式PDF

  • 申请/专利权人 シルトロン インク;

    申请/专利号JP20020242214

  • 发明设计人 崔 日 洙;朴 峯 模;

    申请日2002-08-22

  • 分类号C30B29/06;C30B15/00;

  • 国家 JP

  • 入库时间 2022-08-21 20:18:57

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