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Device manufacturing method, mask set for use in the method, data set for controlling programmable patterning apparatus, method of creating mask pattern, and computer program
Device manufacturing method, mask set for use in the method, data set for controlling programmable patterning apparatus, method of creating mask pattern, and computer program
Isolated dark features, e.g. contact holes or lines, are exposed in a double exposure, using for example a box-in-box pattern (Fig.2C and Fig.2D), and using different illumination settings in the two exposures. IMAGE IMAGE IMAGE IMAGE
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