Being production manner of the high density ITO sintering body above density 6.99g/cm3 which utilizes

摘要

PROBLEM TO BE SOLVED: To provide a method for producing a high-density ITO sintered compact suitable for use as a sputtering target, through slurry casting molding process using ITO(indium oxide-tin oxide) recycled powder as feedstock. SOLUTION: This method for producing a high-density ITO sintered compact comprises the following steps: ITO sintered compacts with ITO targets after used for sputtering film formation, or indium oxide, tin oxide as feedstocks are subjected to autogenous grinding into powder, which, in turn, heat-treated to adjust the specific surface area to 2.5-7.0 m2 /g, and the resulting powder is molded through slurry casting molding process to obtain a molded form, which is then sintered in an oxygen atmosphere.