Being the resist film removal device which is used in the resist film removal device and resist film removal manner,

摘要

PROBLEM TO BE SOLVED: To change a cleaning fluid to a liquid-drop state considering the reduction in energy when spraying the cleaning fluid on a resist film on the surface of a substrate to remove the resist film, and further to control the temperature of the liquid drop when coming into contact with the resist film to a desired value, thereby reliably removing the resist film.;SOLUTION: A leaf shaped resist removing device is constituted by a process chamber 101 in which a substrate 111 to be cleaned is installed to constitute a closed space, and a spray nozzle 102 for spraying the cleaning fluid on the surface of the substrate 111 in a so-called liquid-drop state. The process chamber 101 forms the closed space involving the substrate 111 in a state that the disposed substrate 111 is opposite to a spray nozzle 102.;COPYRIGHT: (C)2004,JPO