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External-cavity semiconductor laser using the same method of manufacturing the same, and a semiconductor optical element having a wide spectrum light emission characteristics

机译:使用相同的制造方法的外腔半导体激光器以及具有广谱发光特性的半导体光学元件

摘要

Semiconductor optical device, and an active layer having multiple quantum wells consisting of a plurality of well layers sandwiched between barrier layers and the plurality of barrier layers formed between the semiconductor substrate and above the semiconductor substrate . It becomes In xa Ga from (1-xa) As layer, the well layers of one, or a range of approximately 0.20 to approximately 0.05 of the composition ratio xa of the In at least one of the well layer of the multiple I take the value of. Thus, it is formed as a strained well layer takes one of the values ​​ranging from approximately 1.5% approximately 0.35% lattice distortion caused in the well layer, a semiconductor optical device, the strain well layer is formed with a band gap wavelength that is different from the well layers of the other. Thus, the optical spectrum characteristics, at between approximately 850nm from approximately 800nm, the semiconductor optical element is configured to provide enable broad optical spectrum characteristic with a spectral half width less than a predetermined value and a center wavelength.
机译:半导体光学器件,以及具有多个量子阱的有源层,所述多个量子阱由夹在势垒层之间的多个势阱层和形成在半导体衬底之间和半导体衬底上方的多个势垒层构成。从(1-xa)变为 xa Ga 作为层,是 one,的阱层或大约0.20至大约0.05的范围在倍数的至少一个阱层中,In的组成比xa的取值I取。因此,它形成为应变阱层取在阱层中引起的约1.5%到约0.35%晶格畸变的值之一,半导体光学器件中,应变阱层形成的带隙波长为与其他的阱层不同。因此,在从大约800nm到大约850nm之间的光谱特性,半导体光学元件被配置为提供允许的宽光谱特性,其光谱半宽度小于预定值和中心波长。

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