首页> 外国专利> METHOD OF MANUFACTURING A THIN-FILM MAGNETIC HEAD, THIN-FILM MAGNETIC HEAD MANUFACTURING APPARATUS, AND THIN-FILM MAGNETIC HEAD MANUFACTURING SYSTEM

METHOD OF MANUFACTURING A THIN-FILM MAGNETIC HEAD, THIN-FILM MAGNETIC HEAD MANUFACTURING APPARATUS, AND THIN-FILM MAGNETIC HEAD MANUFACTURING SYSTEM

机译:薄膜磁头的制造方法,薄膜磁头的制造装置以及薄膜磁头的制造系统

摘要

A method of manufacturing a thin-film magnetic head works a part to be worked to a target length by carrying out an etching process on an object to be worked using an etching apparatus. The method carries out a measuring process that measures a length before working of a part to be worked using a measuring apparatus and a calculation process that calculates the processing time of the etching process required to work the part to be worked from the length before working to the target length based on a first calculation result correcting parameter obtained in advance corresponding to the measuring apparatus, a second calculation result correcting parameter obtained in advance corresponding to a position of the part to be worked, a third calculation result correcting parameter obtained in advance corresponding to a value of a current supplied to an electrode of the etching apparatus during the etching process, a fourth calculation result correcting parameter obtained in advance corresponding to a total usage time of the electrode, the length before working, and the target length. The etching process is carried out on the object to be worked for the calculated processing time.
机译:薄膜磁头的制造方法是通过使用蚀刻装置对被加工物进行蚀刻处理而将被加工部加工成目标长度。该方法执行测量过程,该测量过程使用测量设备来测量待加工部件的工作之前的长度;以及计算过程,其计算从待加工部件的长度到加工前的长度来计算加工待加工部件所需的蚀刻工艺的处理时间。目标长度基于与测量设备相对应的预先获得的第一计算结果校正参数,与待加工零件的位置相对应的预先获得的第二计算结果校正参数,相对应的预先获得的第三计算结果校正参数将在蚀刻处理期间供应给蚀刻装置的电极的电流的值设为预先获得的第四计算结果校正参数,该第四计算结果校正参数对应于电极的总使用时间,工作前的长度和目标长度。在要计算的处理时间内对要加工的对象进行蚀刻处理。

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