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THIN FILM FORMATION BY ATOMIC LAYER GROWTH AND CHEMICAL VAPOR DEPOSITION
THIN FILM FORMATION BY ATOMIC LAYER GROWTH AND CHEMICAL VAPOR DEPOSITION
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机译:通过原子层生长和化学气相沉积形成薄膜
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摘要
A method for forming a thin film on a substrate using a showerhead includes forming an atomic layer deposition (ALD) film and a chemical vapor deposition (CVD) film continuously, or forming a thermal ALD film and a plasma ALD film continuously, by using a showerhead including an upper compartment and a lower compartment which is disposed underneath and overlapped by the upper compartment as viewed in an axial direction of the showerhead and is not gas-communicated with the upper compartment.
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