METHODS AND SYSTEMS FOR POSITIONING A LASER BEAM SPOT RELATIVE TO A SEMICONDUCTOR INTEGRATED CIRCUIT USING A PROCESSING TARGET AS A METROLOGY TARGET

摘要

Various methods and systems measure, determine, or align a position of a laser beam spot relative to a semiconductor substrate having structures on or within the semiconductor substrate to be selectively processed by delivering a processing laser beam to a processing laser beam spot. The various methods and systems utilize those structures themselves to perform the measurement, determination, or alignment.