CLEANING WAFER INCLUDING DETERGENT LAYER FOR EXPOSURE APPARATUS OF IMMERSION LITHOGRAPHY SYSTEM, COMPOSITION OF DETERGENT LAYER, METHOD OF USING CLEANING WAFER AND APPLICATION SYSTEM

摘要

A method of an in situ cleaning of an objective lens of a semiconductor apparatus includes placing a cleaning wafer having a detergent layer on a scanning stage of the semiconductor apparatus. A cleaning composition in the detergent layer is dissolved by using an immersion liquid (water), so that the cleaning composition reacts with the contaminants on the objective lens. Thereafter, the objective lens is rinsed with another solvent.