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ELECTRON BEAM LITHOGRAPHY APPARATUS AND METHOD FOR COMPENSATING FOR ELECTRON BEAM MISALIGNMENT
ELECTRON BEAM LITHOGRAPHY APPARATUS AND METHOD FOR COMPENSATING FOR ELECTRON BEAM MISALIGNMENT
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机译:电子束光刻技术和补偿电子束失准的方法
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摘要
Linear movement direction of the stage and the actual deflection direction of the electron beam deflected by the first command signal for deflecting the electron beam in the linear movement direction of the stage do not necessarily align with each other for reasons such as the disposition precision of the stage driving device, a lens system, and the deflecting device. Therefore, the first command signal output from the first command device is processed based on the angle between the linear movement direction of the stage driven by the stage driving device and the deflection direction of the electron beam deflected by the first command signal so that the deflection direction of the electron beam aligns with the linear movement direction of the stage. With this processed first command signal, the deflection direction of the electron beam can be changed (rotated) to align with the linear movement direction of the stage.
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