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Memory cell unit, nonvolatile semiconductor storage device including memory cell unit, and memory cell array driving method

机译:存储单元单元,包括该存储单元单元的非易失性半导体存储装置以及存储单元阵列驱动方法

摘要

A memory cell unit including: a semiconductor substrate having a source diffusion layer in at least a part of a surface thereof; a column-shaped semiconductor layer provided on the semiconductor substrate, and having a drain diffusion layer provided in an uppermost portion thereof and a first low concentration impurity diffusion layer provided in an entire bottom portion thereof; a memory cell arrangement which includes a plurality of memory cells provided in a peripheral wall of the column-shaped semiconductor layer and connected in series perpendicularly to the substrate, the memory cells each having a charge storage layer and a control gate; a second impurity diffusion layer provided at a lower end of the memory cell arrangement; and a selection transistor having a gate electrode provided around the peripheral wall of the column-shaped semiconductor layer and connecting the second impurity diffusion layer and the first impurity diffusion layer; wherein the first impurity diffusion layer extends into a part of a channel region provided in the peripheral wall of the column-shaped semiconductor layer in opposed relation to the gate electrode of the selection transistor.
机译:一种存储单元单元,包括:半导体基板,在其表面的至少一部分中具有源极扩散层;以及柱状半导体层,设置在半导体基板上,在其最上部具有漏极扩散层,在其整个底部具有第一低浓度杂质扩散层。一种存储单元装置,其包括多个存储单元,该多个存储单元设置在柱状半导体层的周壁中并且垂直于基板串联连接,每个存储单元具有电荷存储层和控制栅极;第二杂质扩散层设置在存储单元装置的下端;选择晶体管,其栅极设置在圆柱状半导体层的周壁的周围,并连接第二杂质扩散层和第一杂质扩散层。其中,第一杂质扩散层相对于选择晶体管的栅电极相对地延伸到设置在柱状半导体层的周壁中的沟道区域的一部分中。

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