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NOR flash memory cell with high storage density

机译:具有高存储密度的NOR闪存单元

摘要

Structures and methods for NOR flash memory cells, arrays and systems are provided. The NOR flash memory cell includes a vertical floating gate transistor extending outwardly from a substrate. The floating gate transistor having a first source/drain region, a second source/drain region, a channel region between the first and the second source/drain regions, a floating gate separated from the channel region by a gate insulator, and a control gate separated from the floating gate by a gate dielectric. A sourceline is formed in a trench adjacent to the vertical floating gate transistor and coupled to the first source/drain region. A transmission line coupled to the second source/drain region. And, a wordline is coupled to the control gate perpendicular to the sourceline.
机译:提供了用于NOR闪存单元,阵列和系统的结构和方法。 NOR快闪存储单元包括从衬底向外延伸的垂直浮栅晶体管。浮栅晶体管具有第一源/漏区,第二源/漏区,在第一和第二源/漏区之间的沟道区,通过栅绝缘体与沟道区分开的浮栅和控制栅通过栅极电介质与浮栅分离。源极线形成在与垂直浮栅晶体管相邻的沟槽中,并耦合到第一源/漏区。传输线耦合到第二源/漏区。并且,字线垂直于源极线耦合到控制栅极。

著录项

  • 公开/公告号US7348237B2

    专利类型

  • 公开/公告日2008-03-25

    原文格式PDF

  • 申请/专利权人 LEONARD FORBES;

    申请/专利号US20040005909

  • 发明设计人 LEONARD FORBES;

    申请日2004-12-06

  • 分类号H01L21/336;

  • 国家 US

  • 入库时间 2022-08-21 20:10:24

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