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Method and apparatus for identifying a problem edge in a mask layout using an edge-detecting process-sensitivity model
Method and apparatus for identifying a problem edge in a mask layout using an edge-detecting process-sensitivity model
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机译:使用边缘检测过程敏感性模型在掩模版图中识别问题边缘的方法和装置
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摘要
One embodiment of the present invention provides a system that identifies a problem edge in a mask layout which is likely to have manufacturing problems. During operation, the system creates an on-target process model that models a semiconductor manufacturing process under nominal process conditions. The system also creates one or more off-target process models that model the semiconductor manufacturing process under one or more process conditions that are different from nominal process conditions. Next, the system computes a process-sensitivity model using the on-target process model and the off-target process models. The system then computes an edge-detecting process-sensitivity model by convolving the process-sensitivity model with an edge-detecting function which can be used to detect edges in an image. Next, the system identifies a problem edge in the mask layout using the edge-detecting process-sensitivity model.
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