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Gate array integrated circuit including a unit cell basic layer having gate terminal regions allowing two contact pads to be disposed laterally

机译:门阵列集成电路,其包括具有栅端子区域的单位单元基本层,该栅端子区域允许两个接触焊盘横向布置

摘要

A gate array integrated circuit forming part of a semiconductor integrated circuit includes a basic layer of a unit cell in which a PMOS and an NMOS transistor are connected with a poly-silicon strip. The poly-silicon strip has gate terminal regions formed to laterally extend to allow two or more contact pads or through-holes to be disposed in each gate terminal region. It is thus possible to improve wiring efficiency and also micro-miniaturization and yield of the gate array integrated circuit. A layout method for a gate array integrated circuit is also provided.
机译:构成半导体集成电路的一部分的栅极阵列集成电路包括单位单元的基本层,其中,PMOS和NMOS晶体管与多晶硅条连接。多晶硅条具有形成为横向延伸的栅极端子区域,以允许在每个栅极端子区域中布置两个或更多个接触焊盘或通孔。因此,可以提高布线效率,并且还可以提高栅极阵列集成电路的微型化和成品率。还提供了用于门阵列集成电路的布局方法。

著录项

  • 公开/公告号US7385233B2

    专利类型

  • 公开/公告日2008-06-10

    原文格式PDF

  • 申请/专利权人 HIROFUMI UCHIDA;

    申请/专利号US20050220657

  • 发明设计人 HIROFUMI UCHIDA;

    申请日2005-09-08

  • 分类号H01L27/10;

  • 国家 US

  • 入库时间 2022-08-21 20:09:42

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