首页> 外国专利> Floating gate memory cell with a metallic source/drain and gate, and method for manufacturing such a floating gate memory gate cell

Floating gate memory cell with a metallic source/drain and gate, and method for manufacturing such a floating gate memory gate cell

机译:具有金属源极/漏极和栅极的浮栅存储单元及其制造方法

摘要

Floating gate memory cell having a first layer with first and second source/drain regions and a channel region arranged between and next to the first and second source/drain regions, and a floating gate layer arranged on the first layer, wherein the first and second source/drain regions and the floating gate layer are formed of a metallically conductive material, and the channel region is formed of an electrically insulating material.
机译:浮栅存储单元,其具有第一层,其具有第一和第二源/漏区以及设置在第一和第二源/漏区之间并与其相邻的沟道区,以及设置在第一层上的浮栅层,其中第一和第二层源/漏区和浮栅层由金属导电材料形成,而沟道区由电绝缘材料形成。

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