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Methods and systems for positioning a laser beam spot relative to a semiconductor integrated circuit using a processing target as an alignment target
Methods and systems for positioning a laser beam spot relative to a semiconductor integrated circuit using a processing target as an alignment target
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机译:使用处理目标作为对准目标相对于半导体集成电路定位激光束光斑的方法和系统
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摘要
A method and system position a laser beam spot relative to a semiconductor substrate having structures on or within the semiconductor substrate to be selectively processed by delivering a processing laser beam to a processing laser beam spot. The method generates a metrology laser beam and propagates the metrology laser beam along a propagation path to a metrology laser beam spot on or near a structure to be selectively processed. The method detects a reflection of the metrology laser beam from the structure, thereby generating a reflection signal, and determining, based on the reflection signal, a position of the metrology laser beam spot relative to the structure.
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